Chemical vapour deposition of diamond using low pressure flat combustion flame

Effective Parameters on Diamond Deposition Using Combustion Flame

Effective Parameters on Diamond Deposition Using Combustion Flame

effective parameters on diamond deposition using combustion flame

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Low Pressure Chemical Vapour Deposition at Quasi- High Flow

A new chemical vapour deposition (CVD) technique is presented. It is especially advantageous for the deposition of compound materials. The technique improves the uniformity and reproducibility of the deposition. The economical use of gaseous reactants is improved by a factor varying between 5 and 20. This is important in the case of expensive metal-organic CVD methods. The method consists in th...

NIRIM type reactor for chemical vapour deposition of diamond Evan

In this paper the design of a simple, space constrained chemical vapour deposition reactor for diamond growth is detailed. Based on the design by NIRIM, the reactor is composed of a quartz discharge tube placed within a 2.45 GHz waveguide to create the conditions required for metastable growth of diamond. Utilising largely off-the-shelf components and a modular design, the reactor allows for ea...